PLASMA INFLUENCE IN TANTALUM SPUTTERING.CHOUAN Y; COLLOBERT D.1977; J. APPL. PHYS.; U.S.A.; DA. 1977; VOL. 48; NO 6; PP. 2274-2279; BIBL. 17 REF.Article

A NEW HYPOTHESIS ABOUT SPUTTERED TANTALUMCOLLOBERT D; CHOUAN Y.1978; THIN SOLID FILMS; NLD; DA. 1978; VOL. 55; NO 3; PP. L15-L16; BIBL. 15 REF.Article

CALCUL EXACT DE LA FONCTION DE DISTRIBUTION DES IONS INCIDENTS SUR UNE CIBLE DANS LE CAS D'UN PLASMA DE PULVERISATION = EXACT ENERGY DISTRIBUTION COMPUTATION OF PARTICLES STRIKING THE TARGET IN SPUTTERINGCHOUAN Y; COLLOBERT D.1982; JOURNAL DE PHYSIQUE; ISSN 0302-0738; FRA; DA. 1982; VOL. 43; NO 2; PP. 279-283; ABS. ENG; BIBL. 12 REF.Article

Doppler-broadened H_α line shapes in a rf low-pressure H₂ dischargeBARAVIAN, G; CHOUAN, Y; RICARD, A et al.Journal of applied physics. 1987, Vol 61, Num 12, pp 5249-5253, issn 0021-8979Article

Low-temperature process for high-mobility polysilicon TFTsLOISEL, B; CHOUAN, Y; PEDRONO, N et al.Electronics Letters. 1987, Vol 23, Num 6, pp 288-289, issn 0013-5194Article

The effect of low pressure on the structure of LPCVD polycrystalline silicon filmsJOUBERT, P; LOISEL, B; CHOUAN, Y et al.Journal of the Electrochemical Society. 1987, Vol 134, Num 10, pp 2541-2545, issn 0013-4651Article